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Articles by Carleen M. Bowers in JoVE

 JoVE Bioengineering

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

1Department of Chemistry, Duke University, 2Hajim School of Engineering and Applied Sciences, University of Rochester, 3Department of Chemical Engineering, University of Rochester


JoVE 3478

Here we describe a simple method for patterning oxide-free silicon and germanium with reactive organic monolayers and demonstrate functionalization of the patterned substrates with small molecules and proteins. The approach completely protects surfaces from chemical oxidation, provides precise control over feature morphology, and provides ready access to chemically discriminated patterns.

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