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 JoVE Applied Physics

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates


JoVE 3725 7/02/2012

Mechanical and Aerospace Engineering, University of Texas at Arlington

A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.

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