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JoVE Journal Chemistry
Atomically Definerte Maler for epitaksiale Vekst av Complex Oxide Thin Films
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Atomically Definerte Maler for epitaksiale Vekst av Complex Oxide Thin Films

Article DOI: 10.3791/52209-v • 08:49 min • December 4th, 2014
December 4th, 2014 •
1, 1, 1, 1, 1, 1
1MESA+ Institute for Nanotechnology, University of Twente

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Ulike prosedyrer er skissert for å forberede atomically definerte maler for epitaxial vekst av komplekse oksid tynne filmer. Kjemiske behandlinger av single krystallinsk SrTiO 3 (001) og DyScO 3 (110) substrater ble utført for å skaffe atomically glatte, enkle avsluttet overflater. Ca 2 Nb 3 O 10 - nanosheets ble brukt til å lage atomically definerte maler på vilkårlige underlag.

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Kjemi Underlag oksyder perovskitter epitaxy tynne filmer enkelt oppsigelse overflatebehandling nanosheets Langmuir-Blodgett
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