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Fabricação de pressão atmosférica de grande porte camada única retangular SnSe flocos
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Fabricação de pressão atmosférica de grande porte camada única retangular SnSe flocos

Article DOI: 10.3791/57023-v • 11:21 min • March 21st, 2018
March 21st, 2018 •
1,2, 2,3, 1, 2,4
1SZU-NUS Collaborative Innovation Center for Optoelectronic Science & Technology, Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, 2Department of Physics, National University of Singapore, 3NUS Graduate School for Integrative Sciences and Engineering, Centre for Life Sciences, 4Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore

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Um protocolo é apresentado demonstrando uma técnica de fabricação de duas etapas para crescer de grande porte de camada única retangular SnSe em forma de flocos no baixo custo SiO2/Si dielétricos discos (wafers) em um sistema de fornalha de tubo de quartzo de pressão atmosférica.

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Engenharia edição 133 camada única grande porte retangular SnSe flocos método sintético em duas fases de vapor de deposição de transporte sistema de pressão atmosférica nitrogênio técnica de gravura
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