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Engineering

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JoVE Journal Engineering
Ensiffriga Nanometer elektronstråle litografi med en Aberration-korrigerade skanning transmissionselektronmikroskop
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Ensiffriga Nanometer elektronstråle litografi med en Aberration-korrigerade skanning transmissionselektronmikroskop

Article DOI: 10.3791/58272-v • 10:25 min • September 14th, 2018
September 14th, 2018 •
1, 1, 1, 1, 1, 1, 1
1Center for Functional Nanomaterials, Brookhaven National Laboratory

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Vi använder en aberration-korrigerade skanning transmissionselektronmikroskop för att definiera ensiffriga nanometer mönster i två utbredda elektronstråle motstår: poly (polymetylmetakrylat) och väte silsesquioxane. Motstå mönster kan replikeras i målet material val med ensiffriga nanometer trohet med liftoff, plasma etsning, och motstå infiltration av organometallics.

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Engineering fråga 139 närfältsmikroskop elektronstråle litografi aberration korrigering elektronmikroskopi nanomaterial mönster överföring e-beam motstår poly (polymetylmetakrylat) väte silsesquioxane
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