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Journal / Engineering / Encifrede Nanometer Electron-Beam litografi med…
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Engineering

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JoVE Journal Engineering
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Encifrede Nanometer Electron-Beam litografi med en Aberration-korrigeret Scanning transmissions elektron mikroskop

Article DOI: 10.3791/58272-v • 10:25 min • September 14th, 2018
September 14th, 2018 •
1, 1, 1, 1, 1, 1, 1
1Center for Functional Nanomaterials, Brookhaven National Laboratory

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Vi bruger en aberration-korrigeret scanning transmissions elektronmikroskop til at definere encifrede nanometer mønstre i to udbredte elektronstråle modstår: poly (methylmethacrylat) og brint silsesquioxane. Modstå mønstre kan replikeres i målet materiale valg med encifrede nanometer troskab med liftoff, plasma ætsning, og modstå infiltration af organometallics.

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Engineering sag 139 Nanofabrication elektronstråle litografi aberration korrektion elektronmikroskopi nanomaterialer mønster overførsel e-beam modstå poly (methylmethacrylat) brint silsesquioxane
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