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JoVE Journal Bioengineering
Fokuseret Ionstrålithografi til etch Nano-arkitekturer i Mikroelektroderne
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Fokuseret Ionstrålithografi til etch Nano-arkitekturer i Mikroelektroderne

Article DOI: 10.3791/60004-v • 13:49 min • January 19th, 2020
January 19th, 2020 •
1, 2,4, 5, 6, 2,3,4
1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

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Vi har vist, at ætsning af Nano-arkitektur i intracortical mikroelektrode enheder kan reducere den inflammatoriske respons og har potentiale til at forbedre elektrofysiologiske optagelser. Metoderne beskrevet heri skitserer en tilgang til etch Nano-arkitekturer i overfladen af ikke-funktionelle og funktionelle enkelt skaft silicium intracortical mikroelektroder.

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Bioteknik fokuseret ionstråle litografi intracortical mikroelektrode Nano-arkitektur Elektrofysiologi neuroinflammation biokompatibilitet
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