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Epitaxiale nanogestructureerde α-quartzfilms op silicium
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Epitaxiale nanogestructureerde α-quartzfilms op silicium: van materiaal tot nieuwe apparaten

Article DOI: 10.3791/61766-v • 11:34 min • October 6th, 2020
October 6th, 2020 •
1, 1, 1, 1, 1
1Institut d'Electronique et des Systemes (IES), CNRS, Université de Montpellier

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Dit werk presenteert een gedetailleerd protocol voor de microfabrication van nanogestructureerde α-kwarts cantilever op een Silicon-On-Insulator (SOI) technologiesubstraat beginnend bij de epitaxiale groei van kwartsfilm met de dipcoatingmethode en vervolgens nanostructuratie van de dunne film via nanoimprintlithografie.

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Engineering nanoimprint lithografie (NIL) nanogestructureerde α-kwarts SOI substraat piëzo-elektrisch microfabricatie lithografie etsen cantilever MEMS
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