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JoVE Journal Engineering
Anvendelse af offer Nanopartikler at fjerne virkningerne af Shot-støj i Kontakt Huller Bearbejdede af E-beam litografi
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Anvendelse af offer Nanopartikler at fjerne virkningerne af Shot-støj i Kontakt Huller Bearbejdede af E-beam litografi

Article DOI: 10.3791/54551-v • 07:51 min • February 12th, 2017
February 12th, 2017 •
1, 2
1Department of Chemistry, Portland State University, 2Logic Technology Department, Intel Corporation

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Ensartet størrelse nanopartikler kan fjerne udsving i anlægshullet dimensioner mønstrede i poly (methylmethacrylat) (PMMA) fotoresist film ved elektronstråle (e-stråle) litografi. Processen involverer elektrostatiske kanalisere til centrum og depositum nanopartikler i kontakt huller, efterfulgt af fotoresist reflow og Plasma- og våd-ætsning trin.

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Engineering E-beam / EUV litografi elektrostatisk kanalisere modstå reflow plasma ætsning
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