Waiting
Login processing...

Trial ends in Request Full Access Tell Your Colleague About Jove
Journal / Chemistry / U2O5 Film forberedelse via UO2 Deposition af…
JoVE Journal
Chemistry

This content is Open Access.

JoVE Journal Chemistry
U2O5 Film forberedelse via UO2 Deposition af jævnstrøm Sputtering og Successive Oxidation og reduktion med atomare ilt og Atomic brint
Simultaneous Measurement of HDAC1 and HDAC6 Activity in HeLa Cells Using UHPLC-MS
Journal (Chemistry)
Simultaneous Measurement of HDAC1 and HDAC6 Activity in HeLa Cells Using UHPLC-MS
Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
Journal (Chemistry)
Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
 
Click here for the English version

U2O5 Film forberedelse via UO2 Deposition af jævnstrøm Sputtering og Successive Oxidation og reduktion med atomare ilt og Atomic brint

Article DOI: 10.3791/59017-v • 12:05 min • February 21st, 2019
February 21st, 2019 •
1, 1, 1, 1
1European Commission, Joint Research Centre, Directorate for Nuclear Safety and Security

Chapters

Summary
Automatic Translation

Please note that all translations are automatically generated.

Click here for the English version.

Denne protokol præsenterer forberedelse af U2O5 tynde film fremstillet i situ under ultra-højt vacuum. Processen indebærer oxidation og reduktion af UO2 film med atomare ilt og atomic brint, henholdsvis.

Tags

Kemi spørgsmålet 144 U2O5 UO3 UO2 film DC sputtering X-ray photoemission spektroskopi oxidation reduktion
Read Article

Get cutting-edge science videos from JoVE sent straight to your inbox every month.

Waiting X
Simple Hit Counter