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JoVE Journal Engineering
Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars
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Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars

Article DOI: 10.3791/60403-v • 08:02 min • February 11th, 2020
February 11th, 2020 •
1, 1, 1, 1, 2, 2, 1
1Water Desalination and Reuse Center (WDRC), Biological and Environmental Science and Engineering (BESE) Division, King Abdullah University of Science and Technology (KAUST), 2Core Labs, King Abdullah University of Science and Technology (KAUST)

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Summary
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This work presents microfabrication protocols for achieving cavities and pillars with reentrant and doubly reentrant profiles on SiO2/Si wafers using photolithography and dry etching. Resulting microtextured surfaces demonstrate remarkable liquid repellence, characterized by robust long-term entrapment of air under wetting liquids, despite the intrinsic wettability of silica.

Tags

SiO2/Si Surfaces Omniphobic Gas-entrapping Microtextures Reentrant Cavities Doubly Reentrant Cavities Pillars GEMS Emulsion And Liquids Surface Chemistry Perfluorinated Coatings Photolithography Dry Etching 3D Printing Complex Micro-scale Topographies Practice Wafers Etching Rates Sample Size Fabrication Process Design Patterns Layout Software Program
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