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Journal / Engineering / Rendering SiO2/Si Surfaces Omniphobic by Carving…
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Engineering

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JoVE Journal Engineering
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Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant og Dobbelt reentrant Kavities eller Søjler

Article DOI: 10.3791/60403-v • 08:02 min • February 11th, 2020
February 11th, 2020 •
1, 1, 1, 1, 2, 2, 1
1Water Desalination and Reuse Center (WDRC), Biological and Environmental Science and Engineering (BESE) Division, King Abdullah University of Science and Technology (KAUST), 2Core Labs, King Abdullah University of Science and Technology (KAUST)

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Dette arbejde præsenterer mikrofabrikationsprotokoller for at opnå hulrum og søjler med reentrant og dobbelt reentrant profiler på SiO2/ Si wafers ved hjælp af fotolithografi og tør ætsning. Resulterende mikroteksturerede overflader demonstrerebemærkelsesværdige flydende afvisende, karakteriseret ved robust langsigtet fastklemning af luft under befugtning væsker, på trods af den iboende vådhed silica.

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Engineering befugtning omniphobicity reentrant og dobbelt reentrant hulrum / søjler gas-omsnøring mikroteksturer (GEMs) fotoliografi isotropisk ætsning anisotropisk ætsning termisk oxid vækst reaktiv-ion ætsning kontaktvinkler nedsænkning konfokal mikroskopi
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