JoVE Journal
Engineering
Engineering
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Summary
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通过提升光刻、纳米深度反应离子蚀刻和室温等离子体,演示了纳米高通道的制造,通过提升光刻、纳米深度反应离子蚀刻和室温等离子体,将表面声波驱动装置集成在硅基硅基硅基上单晶尼欧比锂的表面激活多层粘接,这一工艺同样适用于将氮化锂与氧化物粘接。