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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Article DOI: 10.3791/52720-v • 08:48 min • November 9th, 2015
November 9th, 2015 •
1, 1, 1
1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering, Université de Sherbrooke

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Summary
Automatic Translation

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

Tags

Selective Area Modification Silicon Surface Wettability Pulsed UV Laser Irradiation Liquid Environment KrF Laser ArF Laser Si Wettability Modification Initial Contact Angle Superhydrophilic Surface OH-terminated Si (001) X-ray Photoelectron Spectroscopy Atomic Force Microscopy Nanospheres Solution Selective Area Biofunctionalization Si-based Biosensing Architectures
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