the-diffusion-of-passive-tracers-in-laminar-shear-flow

The Diffusion of Passive Tracers in Laminar Shear Flow

A simple method to experimentally observe and measure the dispersion of a passive tracer in a laminar fluid flow is described. The method consists of ...

adapting-taylor-dispersion-to-measure-dispersion-coefficient

Adapting Taylor Dispersion to Measure the Dispersion Coefficient of Electrolyte Solutions via an Accessible Microfluidic Setup

The field of microfluidics has become increasingly prominent as it allows for rapid and precise control of fluids and particles, making it easier to ...

University of North Carolina at Chapel Hill

Worcester Polytechnic Institute

Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.

ArticleTotal : 2	Year
Publication title Cited by 4	2018
Publication title	2025

Francesca Bernardi

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