Plasma Sources and Applications Centre, Nanyang Technological University
Affiliated withNanyang Technological University
Research Area
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Article Total : 1 | Year |
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![]() Publication title Cited by 7 | 2019 |
Article | Year |
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Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition. Nanotechnology| PubMed ID: 21730481 | 2007 |