Patterning via Optical Saturable Transitions - Fabrication and Characterization

Precious Cantu; Trisha L. Andrew; Rajesh Menon

doi:10.3791/52449

Journal

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Engenharia

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Patterning via ópticos de saturação Transitions - Fabricação e caracterização

Patterning via Optical Saturable Transitions – Fabrication and Characterization

JoVE Journal
Engenharia

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JoVE Journal Engenharia

Patterning via Optical Saturable Transitions – Fabrication and Characterization

Patterning via ópticos de saturação Transitions - Fabricação e caracterização

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6,767 Views

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08:19 min

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December 11, 2014

DOI:

10.3791/52449-v

DOI:

10.3791/52449-v

•

08:19 min

December 11, 2014

•

1 Views

Precious Cantu¹, Trisha L. Andrew², Rajesh Menon¹

¹Department of Electrical and Computer Engineering,The University of Utah, ²Department of Chemistry,The University of Wisconsin-Madison

Summary

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.^1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.