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Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition
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Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition

Article DOI: 10.3791/53543-v • 07:37 min • December 21st, 2015
December 21st, 2015 •
1, 2
1Institut des Nanotechnologies de Lyon, CNRS-École Centrale de Lyon, 2Institut de Ciència de Materials de Barcelona, Consejo Superior de Investigaciones Científicas

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A protocol is presented for the preparation of piezoelectric macroporous epitaxial films of quartz on silicon by solution chemistry using dip-coating and thermal treatments in air.

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Macroporous Epitaxial Quartz Films Silicon Chemical Solution Deposition Sol-gel Synthesis Dip-coating Technique Thermal Treatment Silica Gel Tetraethyl Orthosilicate HCl Ethanol Mesoporous Epitaxial Quartz Films Alkaline Earth Ions Sr2+ Glass Melting Agents Cetyl Trimethylammonium Bromide (CTAB) Amphiphilic Template Phase Separation Quartz-silicon Cell Parameters Epitaxial Growth
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