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Engineering
Rádio frequência Magnetron Sputtering do GdBa2Cu3O7−
Rádio frequência Magnetron Sputtering do GdBa2Cu3O7−
JoVE Journal
Engineering
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JoVE Journal Engineering
Radio Frequency Magnetron Sputtering of GdBa2Cu3O7−δ/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates

Rádio frequência Magnetron Sputtering do GdBa2Cu3O7−δ/ La0,67Sr0,33MnO BICAMADA de quase3 filmes em substratos de único-cristal SrTiO3 (STO)

Full Text
8,161 Views
06:49 min
April 12, 2019

DOI: 10.3791/58069-v

Ying Wang1,2, Zhen Li1,2, YongSheng Liu1, Yijie Li2, Linfei Liu2, Da Xu2, Xiaojing Luo1, Tian Gao1,3, Yanyan Zhu1,4, Luozeng Zhou3, Jianming Xu3

1Department of Physics, Mathematics, Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power,Shanghai University of Electric Power, 2Key Laboratory of Artificial Structure and Quantum Control, Ministry of Education, Department of Physics,Shanghai Jiao Tong University, 3Shanghai Institute of Space Power-sources, 4Shanghai Key Laboratory of High Temperature Superconductors,Shanghai University

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Overview

This article presents a protocol for growing LSMO nanoparticles and Gd BCO films on SrTiO3 single-crystal substrates using radio frequency sputtering. The method allows for uniform deposition of nanoparticles and films in the same vacuum chamber.

Key Study Components

Area of Science

  • Nanoparticle synthesis
  • Thin film deposition
  • Superconducting materials

Background

  • LSMO nanoparticles are important for various applications.
  • GBCO films are known for their superconducting properties.
  • Combining these materials can enhance performance in electronic devices.
  • Utilizing the same vacuum chamber streamlines the deposition process.

Purpose of Study

  • To develop a method for uniform growth of LSMO nanoparticles.
  • To achieve high-quality GBCO films on single-crystal substrates.
  • To provide insights into film and nanoparticle growth areas.

Methods Used

  • Radio frequency sputtering technique.
  • Deposition on (001) SrTiO3 substrates.
  • Utilization of a vacuum chamber for simultaneous deposition.
  • Characterization of nanoparticle and film quality.

Main Results

  • Uniform size of LSMO nanoparticles achieved.
  • High-quality superconducting GBCO films deposited.
  • Insights into the deposition process were gained.
  • Method applicable for other metal film and nanoparticle deposition.

Conclusions

  • The protocol allows for efficient deposition of nanoparticles and films.
  • Researchers can learn about vacuum equipment and film growth technology.
  • This method has potential applications in various fields of material science.

Frequently Asked Questions

What materials are used in this protocol?
LSMO nanoparticles and Gd BCO films are used in this protocol.
What is the main advantage of this method?
The main advantage is the ability to deposit both nanoparticles and films in the same vacuum chamber.
How does this method contribute to research?
It provides insights into film deposition and nanoparticle growth, enhancing understanding of material properties.
Can this method be applied to other materials?
Yes, it can also be applied to metal film and nanoparticle deposition.
What skills can researchers gain from this protocol?
Researchers can become familiar with vacuum equipment and learn about film growth technology.

Aqui, apresentamos um protocolo para crescer LSMO nanopartículas e (Gd) BCO filmes em (001) SrTiO3 (STO) único-cristal substratos por rádio frequência (RF)-sputtering.

Este método pode criar as nanopartículas LSMO uniformemente em um substrato de cristal único STO. Além disso, o filme GBCO pode ser obtido através do mesmo método na mesma câmara de vácuo. A principal vantagem desta tecnologia é que as nanopartículas LSMO com tamanho uniforme e filme GBCO supercondutor de alta qualidade podem ser depositadas na mesma câmara de vácuo.

Este método pode fornecer informações sobre a área de deposição de filmes, área de crescimento de nanopartículas, etc. Também pode ser aplicado à deposição de filme de metal, deposição de nanopartículas de metal, etc. Este método permitirá que os pesquisadores se familiarizem com equipamentos de vácuo e aprendam mais sobre a tecnologia de crescimento de filmes.

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