$$\rightleftharpoonup{xx}$$
$$\longleftharp{xx}$$,
$$\longrightharp{xx}$$,
Part I: Patterning of the electrodes
- Clean and dehydrated ITO coated glass slides were coated with positive photoresist
- The surface was baked at 100°C to remove solvents from the resist
- After baking, the surface was exposed to ultraviolet light through a photomask using the Canon Mask Aligner
- The exposed regions were removed in a developer solution
- The surface was hard baked to remove any remaining developer solution
- The ITO regions not protected by photoresist patterning were etched away in an acid etchant
- Remaining photoresist was removed by sonicating in acetone to form the ITO electrodes
Part II: Surface modification
- Modified electrodes are cleaned in a plasma chamber and modified with 2% PEG silane in toluene. Incubation is carried out for 2 hours, followed by 2 hours of baking.
Note: This process is carried out in a glove bag filled with nitrogen to avoid presence of moisture, as PEG silane is reactive towards it.
Part III: Electrochemistry
- Steel wires are attached to electrode pads.
- The PEG silane modified electrodes are placed in an electrochemical cell to perform electrochemical experiments.
- PEG silane from interconnected regions is stripped using a three-electrode system in PBS.
Part IV: Cell patterning
- Fibroblasts are incubated with the recently stripped substrates. Upon incubation, these cells attach to the PEG silane stripped regions; however, the cells will not bind anywhere else on the surface.
- Patterned cells are incubated in fresh media and visualized using a microscope.