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Method Article

Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

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DOI:

10.3791/55257

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April 4th, 2017

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In This Article

Summary

Silicon photonic chips have the potential to realize complex integrated quantum systems. Presented here is a method for preparing and testing a silicon photonic chip for quantum measurements.

Abstract

Silicon photonic chips have the potential to realize complex integrated quantum information processing circuits, including photon sources, qubit manipulation, and integrated single-photon detectors. Here, we present the key aspects of preparing and testing a silicon photonic quantum chip with an integrated photon source and two-photon interferometer. The most important aspect of an integrated quantum circuit is minimizing loss so that all of the generated photons are detected with the highest possible fidelity. Here, we describe how to perform low-loss edge coupling by using an ultra-high numerical aperture fiber to closely match the mode of the silicon waveguides. By using an optimized fusion splicing recipe, the UHNA fiber is seamlessly interfaced with a standard single-mode fiber. This low-loss coupling allows the measurement of high-fidelity photon production in an integrated silicon ring resonator and the subsequent two-photon interference of the produced photons in a closely integrated Mach-Zehnder interferometer. This paper describes the essential procedures for the preparation and characterization of high-performance and scalable silicon quantum photonic circuits.

Introduction

Silicon is showing great promise as a photonics platform for quantum information processing1,2,3,4,5. One of the vital components of quantum photonic circuits is the photon source. Photon-pair sources have been developed from silicon in the form of micro-ring resonators made via a third-order nonlinear process, spontaneous four-wave mixing (SFWM)6,7,8. These sources are capable of producing pairs of indistinguishab....

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Protocol

NOTE: This protocol assumes that the photonic chip has already been fabricated. The chip described here (shown in Figure 1A) was fabricated at the Cornell University NanoScale Science & Technology Facility using standard processing techniques for silicon photonic devices11. These include the use of silicon-on-insulator wafers (composed of a 220 nm-thick silicon layer, a 3-µm layer of silicon dioxide, and a 525 µm-thick silicon substrate), electron-beam lithography to define the strip waveguides (500 nm-wide), and the plasma-enhanced chemical vapor deposition of the silicon dioxide cladding (~3 µm-thick). The micro-ring resonato....

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Results

Individual photon counts from each detector, as well as the coincidence counts, were collected as the relative phase between the two paths was tuned. The individual counts (Figure 5A) show the classical interference pattern from an MZI with visibilities of 94.5 ± 1.6% and 94.9 ± 0.9%. The coincidence measurements (Figure 5B) show the quantum interference of the entangled state, as is evident by the oscillation at twice the frequency of the classical inter.......

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Discussion

There are multiple challenges for the field of integrated photonics to overcome in order for complex and scalable systems of photonic devices to be feasible. These include, but are not limited to: tight fabrication tolerances, isolation from environmental instabilities, and minimization of all forms of loss. There are critical steps in the above protocol that help to minimize the loss of photonic devices.

One of the most crucial requirements in minimizing loss is closely matching the optical m.......

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Disclosures

We have nothing to disclose.

Acknowledgements

This work was performed in part at the Cornell University NanoScale Science and Technology Facility, a member of the National Nanotechnology Infrastructure Network, which is supported by the National Science Foundation (Grant ECCS-1542081). We acknowledge support for this work from the Air Force Research Lab (AFRL). This material is based upon work partially supported by the National Science Foundation under Award No. ECCS14052481.

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Materials

List of materials used in this article
NameCompanyCatalog NumberComments
3-Axis NanoMax Flexure StageThorlabsMAX312DPrecision 3-axis stages
Three-Hole Fiber Stripping ToolThorlabsFTS4buffer stripping tool
Three Channel Piezo ControllerThorlabsMDT693BPiezo controllers for NanoMax stages
Fiber Polarization ControllerThorlabsFPC5623-Paddle fiber-based polarization controller
Fiber CleaverThorlabsXL411Fiber cleaver
Standard V-Groove Fiber HolderThorlabsHFV001standard v-groove mount
Tapered V-Groove Fiber HolderThorlabsHFV002tapered v-groove mount
Right-Angle Top Plate for NanoMax StageThorlabsAMA011right-angle bracket
50:50 Fiber Optic CouplerThorlabsTW1550R5F150/50 combiner
Optical Fiber Fusion SplicerFujikuraFSM-40SFusion splicer
MultiPrep Polishing System - 8"Allied High Tech15-2100Chip polisher
GreenLubeAllied High Tech90-209010Polishing Lubricant
Cross-Sectioning Paddle with Reference EdgeAllied High Tech15-1010-REPolishing mount
Lightwave Measurement SystemKeysight8164BMainframe for tunable laser
Tunable Laser SourceKeysight81606ATunable laser
Optical Power SensorKeysight81634BPower meter
NIR Single Photon DetectorID QuantiqueID210Single photon detectors
NIR Single Photon DetectorID QuantiqueID230Low noise, free-running single photon detectors
PicoHarpPicoQuantPicoHarp 300Time-correlated single photon counting
WiDy SWIR InGaAs CameraNIT640U-SIR Camera
WDM Bandpass FilterJDS Uniphase30055053-368-2.2pump cleanup filters
WDM Bandpass FilterJDS Uniphase1011787-012pump rejection filters
Ultra-High Numerical Aperture FiberNufernUHNA-7high index fiber
Ultra Optical Single Mode FiberCorningSMF-28standard single mode fiber

References

  1. Silverstone, J. W., et al. On-chip quantum interference between silicon photon-pair sources. Nat. Photon. 8 (2), 104-108 (2014).
  2. Harris, N. C., et al. Integrated Source of Spectrally Filtered Correlated Photons for Large-Scale Quantum Photonic Systems. Phys. Rev. X. 041047, 1-10 (2014).
  3. Grassani, D., et al.

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