JoVE Journal
Engineering
Engineering
A subscription to JoVE is required to view this content.
You will only be able to see the first 2 minutes.
Chapters
Summary December 11th, 2014
We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.
