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Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition
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JoVE Journal Chemistry
Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

DOI:
10.3791/54268-v

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09:45 min

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July 26, 2016

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, , ,
1McKetta Department of Chemical Engineering,The University of Texas at Austin

Chapters

  • 00:05Title
  • 01:20Cleaning the Germanium Substrate
  • 02:46Loading to the Vacuum System and Germanium Deoxidization
  • 04:30Thin Film ALD Growth and Annealing of the Strontium Titanate (STO) Film
  • 07:23Results: RHEED and X-ray Diffraction Analysis
  • 08:41Conclusion

Summary

Automatic Translation

Automatic Translation

This work details the procedures for the growth and characterization of crystalline SrTiO3 directly on germanium substrates by atomic layer deposition. The procedure illustrates the ability of an all-chemical growth method to integrate oxides monolithically onto semiconductors for metal-oxide semiconductor devices.

Tags

Keywords: Epitaxial GrowthPerovskiteStrontium TitanateGermaniumAtomic Layer DepositionMicroelectronicsDielectricCrystalline OxidesInterface StatesManufacturingPrecursorsMolecular Beam EpitaxySubstrate CleaningUV Ozone CleaningVacuum System

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