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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
JoVE Journal
Bioengineering
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JoVE Journal Bioengineering
Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

DOI:
10.3791/56967-v

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09:45 min

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June 12, 2018

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, , , , , ,
1Manchester Institute of Biotechnology & School of Chemistry,University of Manchester, 2School of Engineering,University of Liverpool, 3School of Electrical and Electronic Engineering,University of Manchester, 4School of Science and Technology,Nottingham Trent University

Chapters

  • 00:04Title
  • 00:47Polymer Pen Lithography (PPL) Array Fabrication and Substrate Mounting
  • 04:29Automatic Pen Array Alignment
  • 06:35Polymer Pen Lithography
  • 08:20Results: Substrate Patterning by PPL
  • 09:08Conclusion

Summary

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Here we present a protocol for wide-area scanning probe nanolithography enabled by the iterative alignment of probe arrays, as well as the utilization of lithographic patterns for cell-surface interaction studies.

Tags

Keywords: Large-area Scanning Probe NanolithographyAutomated AlignmentSubstrate FabricationCell Culture StudiesPDMS PrepolymerSilicon MasterPPL ArrayOxygen Plasma TreatmentAFM Lithography

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