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JoVE Journal
Engineering

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Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
 

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Article doi: 10.3791/57103
May 23rd, 2018

Summary May 23rd, 2018

Thin films (100-1000 Å) of vanadium dioxide (VO2) were created by atomic-layer deposition (ALD) on sapphire substrates. Following this, the optical properties were characterized through the metal-insulator transition of VO2. From the measured optical properties, a model was created to describe the tunable refractive index of VO2.

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