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Niobium Oxide Films Deposited by Reactive Sputtering

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Article DOI: 10.3791/59929-v 08:23 min
September 28th, 2019


Summary September 28th, 2019

Here, we present a protocol for niobium oxide films deposition by reactive sputtering with different oxygen flow rates for use as an electron transport layer in perovskite solar cells.


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