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Nanoimprinting elettrochimico assistito da metalli di wafer di silicio poroso e solido

Article DOI: 10.3791/61040-v • 09:18 min • February 8th, 2022
February 8th, 2022 •
1, 1, 1, 1
1The Polytechnic School, Arizona State University

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Viene presentato un protocollo per l'imprinting chimico assistito da metallo di caratteristiche di microscala 3D con precisione di forma inferiore a 20 nm in wafer di silicio solidi e porosi.

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Ingegneria Numero 180 nanoimprinting nanoimprinting elettrochimico MACE incisione chimica assistita da metalli fotonica del silicio microfabbricazione microingegneria
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