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Epitaxial Nanostructured α-Quartz Films on Silicon
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Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices

Article DOI: 10.3791/61766-v • 11:34 min • October 6th, 2020
October 6th, 2020 •
1, 1, 1, 1, 1
1Institut d'Electronique et des Systemes (IES), CNRS, Université de Montpellier

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Ces travaux présentent un protocole détaillé pour la microfabrication du porte-à-faux nanostructuré de α quartz sur un substrat technologique silicon-on-isolateur (SOI) à partir de la croissance épitaxique du film de quartz avec la méthode de revêtement de trempette, puis la nanostructuration du film mince par lithographie nanoimprint.

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Ingénierie Numéro 164 lithographie nanoimprint (NIL) nanostructures α-quartz substrat SOI piézoélectrique microfabrication lithographie gravure porte-à-faux MEMS
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