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Engineering
在通过X射线计算机断层扫描(CT)和与扫描电子显微镜相关光学显微镜(LM)的一个组合的LED深度分析(SEM...
在通过X射线计算机断层扫描(CT)和与扫描电子显微镜相关光学显微镜(LM)的一个组合的LED深度分析(SEM...
JoVE Journal
Engineering
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JoVE Journal Engineering
In Depth Analyses of LEDs by a Combination of X-ray Computed Tomography (CT) and Light Microscopy (LM) Correlated with Scanning Electron Microscopy (SEM)

在通过X射线计算机断层扫描(CT)和与扫描电子显微镜相关光学显微镜(LM)的一个组合的LED深度分析(SEM)的

Full Text
9,799 Views
10:42 min
June 16, 2016

DOI: 10.3791/53870-v

Jörg Meyer1, Christian Thomas1, Frank Tappe1, Tekie Ogbazghi1

1Department Lippstadt,Hamm-Lippstadt University of Applied Sciences

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Please note that some of the translations on this page are AI generated. Click here for the English version.

Overview

This article outlines a multimodal micro-characterization workflow for active optical devices, integrating structural and functional investigations. The method is exemplified using a white LED that remains operational during characterization.

Key Study Components

Area of Science

  • Micro-characterization
  • Optical devices
  • Microelectronics

Background

  • Importance of linking optical properties to microstructure.
  • Applications in failure analysis and reverse engineering.
  • Relevance to composite material characterization.
  • Potential for preventing device failures.

Purpose of Study

  • To provide a comprehensive method for location-dependent data correlation.
  • To enhance understanding of microelectronic devices.
  • To facilitate the analysis of structural defects.

Methods Used

  • X-ray Computed Tomography (CT)
  • Light Microscopy (LM)
  • Scanning Electron Microscopy (SEM)
  • Operational characterization of devices during analysis

Main Results

  • Successful integration of multiple imaging techniques.
  • Demonstrated correlation between optical and structural properties.
  • Insights into device failure mechanisms.
  • Applicability to other materials beyond microelectronics.

Conclusions

  • The method provides a robust framework for micro-characterization.
  • It offers valuable insights into the relationship between structure and function.
  • Potential to improve reliability and performance of optical devices.

Frequently Asked Questions

What is the main advantage of this micro-characterization technique?
The main advantage is the ability to link optical properties to microstructural details, aiding in failure analysis and device optimization.
Can this method be applied to materials other than microelectronics?
Yes, it can also be applied to the characterization of composite materials.
What imaging techniques are used in this study?
The study employs X-ray Computed Tomography, Light Microscopy, and Scanning Electron Microscopy.
How does this method help in preventing device failures?
By linking optical defects to structural or electrical defects, it allows for targeted improvements in device design.
Is the device operational during the characterization process?
Yes, the method allows for the device to remain operational during the characterization.
What type of optical device was used as an example in this study?
A white LED was used as an example to demonstrate the method.

一种有源光器件的全面的微特征的工作流程概述。它包含CT,LM和扫描电镜结构以及功能调查。该方法被证明为白色LED可仍然表征期间进行操作。

这种多模态微观表征程序的总体目标是提供一种通过 X 射线计算机断层扫描、光学显微镜和扫描电子显微镜获取的数据的位置依赖性相关性的方法。这种方法可以帮助回答微表征领域的关键问题,例如微电子器件的故障分析或逆向工程。该技术的主要优点是样品的光学特性可能与微观结构甚至亚微米结构细节相关联。

该技术的含义延伸到防止设备故障,因为光学缺陷或均匀性可以明确且可追溯地与设备的结构或电气缺陷相关联。因此,这种方法可以提供对微电子器件的见解。它还可以应用于其他结构分析,例如复合材料的表征。

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