Porous Silicon Film

Porous silicon film is a silicon-based material containing an interconnected network of nanoscale or microscale pores, making it useful when high surface area and tunable transport are needed. In bioengineering, it is commonly produced by electrochemical etching, which selectively dissolves silicon and allows control over pore size, porosity, and film thickness; surface oxidation or chemical functionalization can then adjust its interactions with biological molecules. These properties support biosensors that detect biomolecular binding through changes in optical or electrical signals, as well as platforms for drug loading and controlled release. Porous silicon films also serve as customizable interfaces for studying cell interactions and developing implantable bioengineering devices.

Porous Silicon Film - Related Videos

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JoVE EoE - Neurotherapeutics

Sustained Delivery of Nerve Growth Factor Using a Porous Silicon Film in Rat Pheochromocytoma 12 Cells

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2025

Source: Rosenberg, M., et al. Designing Porous Silicon Films as Carriers of Nerve Growth Factor. J. Vis. Exp. (2019).This video demonstrates the use of a degradable nanostructured porous silicon (PSi) film for the sustained release of nerve growth factor (NGF) to support PC12 cell differentiation. NGF is adsorbed onto the film’s pores through electrostatic interactions and is gradually released into the media by diffusion and scaffold degradation. This controlled delivery promotes PC12 cell...

Research

JoVE Journal - Bioengineering
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Designing Porous Silicon Films as Carriers of Nerve Growth Factor

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Cited by 3 •

2019

Here, we present a protocol to design and fabricate nanostructured porous silicon (PSi) films as degradable carriers for the nerve growth factor (NGF). Neuronal differentiation and outgrowth of PC12 cells and mice dorsal root ganglion (DRG) neurons are characterized upon treatment with the NGF-loaded PSi carriers.

Fabrication and Optimization of Type II Silicon Clathrate Films

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2025

The two-thermal annealing method enables the fabrication of thin films of type II semiconductor silicon clathrate. Post-synthesis treatments, including thermal pressing and reactive ion etching, were performed to improve the material properties. This approach provides an accessible pathway for fabricating tunable clathrate films suitable for next-generation electronic and photonic devices.

Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition

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Cited by 7 •

2015

A protocol is presented for the preparation of piezoelectric macroporous epitaxial films of quartz on silicon by solution chemistry using dip-coating and thermal treatments in air.

Polycrystalline Silicon Thin-film Solar cells with Plasmonic-enhanced Light-trapping

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Cited by 9 •

2012

Polycrystalline silicon thin-film solar cells on glass are fabricated by deposition of boron and phosphorous doped silicon layers followed by crystallisation, defect passivation and metallisation. Plasmonic light-trapping is introduced by forming Ag nanoparticles on the silicon cell surface capped with a diffused reflector resulting in ~45% photocurrent enhancement.

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