Silicon Dioxide Surface

A silicon dioxide surface is the outer layer of a silica-based material that forms a chemically active interface for biological and engineering systems. In aqueous conditions, surface Si–O–Si bonds can hydrolyze to form silanol groups, whose protonation state influences surface charge, hydration, wettability, and interactions with biomolecules. These properties allow researchers to modify silica with polymers, linkers, or affinity molecules to control protein adsorption and immobilize biological probes. In bioengineering, silicon dioxide surfaces support biosensors, microfluidic devices, cell studies, and tissue interfaces, enabling reproducible control of molecular binding, transport, and signal generation.

Silicon Dioxide Surface - Related Videos

Research

JoVE Journal - Engineering

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds

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Cited by 9 •

2013

A detailed procedure for surface doping of Silicon interfaces is provided. The ultra-shallow surface doping is demonstrated by using phosphorus containing monolayers and rapid annealing process. The method can be used for doping of macroscopic area surfaces as well as nanostructures.

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

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Cited by 1 •

2015

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

Tools for Surface Treatment of Silicon Planar Intracortical Microelectrodes

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Cited by 3 •

2022

The present protocol describes tools for handling silicon planar intracortical microelectrodes during treatments for surface modification via gas deposition and aqueous solution reactions. The assembly of the components used to handle the devices throughout the procedure is explained in detail.

Fabrication and Optimization of Type II Silicon Clathrate Films

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2025

The two-thermal annealing method enables the fabrication of thin films of type II semiconductor silicon clathrate. Post-synthesis treatments, including thermal pressing and reactive ion etching, were performed to improve the material properties. This approach provides an accessible pathway for fabricating tunable clathrate films suitable for next-generation electronic and photonic devices.

Education

JoVE Core - Microbiology

Carbon-dioxide Fixation

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2025

Carbon dioxide fixation in prokaryotes enables the assimilation of inorganic carbon into organic molecules, supporting biosynthetic pathways, sustaining ecosystems, and contributing to the global carbon cycle. It also has industrial applications in carbon capture and bioproduct synthesis. Autotrophic organisms rely on this process to utilize CO₂ as a carbon source in diverse environments.The Calvin CycleThe Calvin cycle is the most widespread carbon fixation mechanism, primarily used by...

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