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Journal / Engineering / 通过硅直接晶圆粘接制造均匀纳米级腔…
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通过硅直接晶圆粘接制造均匀纳米级腔
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通过硅直接晶圆粘接制造均匀纳米级腔

Article DOI: 10.3791/51179-v • 10:32 min • January 9th, 2014
January 9th, 2014 •
1, 2,3, 4, 5, 1
1Department of Physics, The State University of New York at Buffalo, 2Joint Quantum Institute, University of Maryland, 3The National Institute of Standards and Technology, 4Cryogenics and Fluids Branch, NASA Goddard Space Flight Center, 5HRL Laboratories

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描述了永久粘合两个硅晶片以实现统一外壳的方法。这包括晶圆制备、清洁、RT 粘接和退化过程。由此产生的粘结晶圆（细胞）具有外壳均匀性~1%1，2。由此产生的几何形状允许测量封闭的液体和气体。

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物理，第83期，硅直接晶圆结合，纳米尺度，粘结晶圆，硅晶圆，密闭液体，石版画技术
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