We describe a procedure to optically trap micro-particles in nanoplasmonic optical lattice.
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Method Article
We describe a procedure to optically trap micro-particles in nanoplasmonic optical lattice.
The plasmonic optical tweezer has been developed to overcome the diffraction limits of the conventional far field optical tweezer. Plasmonic optical lattice consists of an array of nanostructures, which exhibit a variety of trapping and transport behaviors. We report the experimental procedures to trap micro-particles in a simple square nanoplasmonic optical lattice. We also describe the optical setup and the nanofabrication of a nanoplasmonic array. The optical potential is created by illuminating an array of gold nanodiscs with a Gaussian beam of 980 nm wavelength, and exciting plasmon resonance. The motion of particles is monitored by fluorescence imaging. A scheme to suppress photothermal convection is also described to increase usable optical power for optimal trapping. Suppression of convection is achieved by cooling the sample to a low temperature, and utilizing the near-zero thermal expansion coefficient of a water medium. Both single particle transport and multiple particle trapping are reported here.
The optical trapping of micro-scale particles was originally developed by Arthur Askin in the early 1970s. Ever since its invention, the technique has been developed as a versatile tool for micro- and nanomanipulation1,2. Conventional optical trapping based on the far-field focusing principle is inherently limited by the diffraction in its spatial confinement, wherein the trapping force decreases dramatically (following an ~a3 law for a particle of radius a)3. To overcome such diffraction limits, researchers have developed near-field optical trapping techniq....
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1. Optical Setup
Note: The principle of the optical setup is illustrated in Figure 1.
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Single particle trajectories were recorded by a CCD camera in our experiment and the images were then processed with a custom program to extract each particle's trajectory16. Representative results are displayed in Figure 3 and Video 1 for micro-spheres with diameters of 2 µm. Multiple particle trappings inside the optical lattice were observed. Successive images extracted from a representative motion video of the part.......
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The procedure described here enables the reader to reliably reproduce trapping on a daily basis. A general empirical guideline to design a usable optical lattice is to use a comparable size for plasmonic nanoarray, interdisc distance, and trapped particle size. Compared to a single, isolated plasmonic nanostructure, the optical lattice design in conjunction with the high optical power afforded by cooling the sample to ~4 °C used here greatly enhances the trapping probability. If well separated, plasmonic nanostructu.......
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The authors have nothing to disclose.
Y. T. Y. would like to acknowledge funding support from the Ministry of Science and Technology under grant numbers MOST 105-2221-E-007-MY3 and from the National Tsing Hua University under grant numbers 105N518CE1 and 106N518CE1.
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| Name | Company | Catalog Number | Comments |
|---|---|---|---|
| Thermoelectric cooling element | Thorlabs | TEC 1.4-6 | TEC element for sample cooling |
| RTD thermometer | Omega Engineering | RTD Thermometer 969C | |
| Forward looking infrared camera | FLIR | FLIR One | IR camera for temperature monitoring |
| light emitting diode light source | Touchbright | Light source for illumination for fluorescent imaging | |
| Long working distance objective | Olympus | LMPLFLN | For illuminating the sample and imaging |
| Optical trap kit | Thorlabs | OTKB/M | |
| Cover slip | thickness 0.17 mm | ||
| Scanning electron microscope | Hitachi | SEM-Hitachi S3400N | |
| Electron beam blanker | DEBEN | PCD beam blanker | the blanker is added to the scanning electron microscope |
| Thermal evaporator | SYSKEY Technology | ||
| Mask aligner | Karl Suss | MJB 3 | For marker fabrication |
| Electron beam resist | Sigma Alrich | PMMA 120K | For e-beam lithography |
| Electron beam resist | Sigma Alrich | PMMA 960K | For e-beam lithography |
| Fluoresent labeled polystyrene microspheres | Polyscience | 2 um diameter | |
| Bipolar transistor | Mouser | 2N3904 | quantity 2 for TEC driver circuit |
| Bipolar transistor | Mouser | 2N3906 | quantity 2 for TEC driver circuit |
| MOSFET power transistor | Mouser | IRF5305 | quantity 2 for TEC driver circuit |
| MOSFET power transistor | Mouser | IRF131ON | quantity 2 for TEC driver circuit |
| 10 kOhm resistor | Mouser | quantity 6 for TEC driver circuit | |
| 910 Ohm resistor | Mouser | quantity 2 for TEC driver circuit | |
| Photoresist | Microchemicals | AZ4620 | For marker fabrication |
| Acetone | Sigma Alrich | For marker fabrication | |
| Fluorescence Module for the OTKB/M, Metric Threads | Thorlabs | OTKB-FL/M | |
| Fluorescent filter set | Thorlabs | MDF-FITC | For Fluorescein Isothiocyanate (FITC) |
| Ultrasonic cleaner | Delta | DC150H | For the lift off step |
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