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Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior
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Bioengineering
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JoVE Journal Bioengineering
Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior

Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior

DOI:
10.3791/54840-v

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09:06 min

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December 08, 2016

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, ,
1Department of Chemical and Biomedical Engineering,West Virginia University, 2Department of Biomedical Engineering,Columbia University

Chapters

  • 00:05Title
  • 00:38Stitching of Poly(dimethylsiloxane) (PDMS) Molds into a Large, Single Mold
  • 03:51Generation of a Master Mold on Polystyrene (PS) Substrates
  • 06:01Nanotopographical Modulation of Cell Behavior
  • 07:33Results: Generated PS Nanopatterns and Nanotopography Modulation of Cell Morphology
  • 08:26Conclusion

Summary

Automatic Translation

Automatic Translation

A protocol for producing a large area of nanopatterned substrate from small nanopatterned molds for study of nanotopographical modulation of cell behavior is presented.

Tags

Keywords: Nanopatterned SubstratesStitch TechniqueNanotopographical ModulationCell BehaviorPDMS MoldSilicon MoldPDMS PrepolymerAnisotropic NanopatternsNanogratingsSubstrate NanotopographyFocal Adhesion ProteinsCost-effectiveSimple TechniqueLarge Area Nanopatterning

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