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Fabrication of Spatially Confined Complex Oxides
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JoVE Journal Ingenieurwesen
Fabrication of Spatially Confined Complex Oxides

Fabrication of Spatially Confined Complex Oxides

DOI:
10.3791/50573-v

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08:45 min

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July 01, 2013

•

,
1Materials Science and Technology Division,Oak Ridge National Laboratory, 2Department of Physics & Astronomy,University of Tennessee, Knoxville

Kapitel

  • 00:05Titel
  • 01:36Sample Growth Fabrication
  • 04:23Photolithography Fabrication
  • 06:34Wire-bonding Connection
  • 07:39Ergebnisse
  • 08:17Conclusion

Summary

Automatische Übersetzung

Automatische Übersetzung

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

Tags

Complex OxidesHigh Tc SuperconductorsMultiferroicsColossal MagnetoresistorsElectronic Phase SeparationThin Film GrowthPhotolithographyWire-bondingMicrostructuresManganite Devices

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