Silicon Properties

Silicon properties encompass the physical, chemical, electrical, and thermal characteristics that make silicon a foundational engineering material. Its crystalline lattice forms strong covalent bonds, while its intermediate band gap allows electrical conductivity to be controlled through temperature, illumination, and the addition of dopants such as boron or phosphorus. Silicon also develops a thin, stable silicon dioxide layer during oxidation, providing an effective insulating surface for patterned devices. These properties support transistors, integrated circuits, photovoltaic cells, sensors, and microelectromechanical systems, while silicon’s abundance, manufacturability, and compatibility with established fabrication processes continue to influence materials selection and device design.

Silicon Properties - Related Videos

Research

JoVE Journal - Engineering

Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators

0 Views •

Cited by 1 •

2025

This article traces the life cycle of a silicon nitride membrane resonator, from design through fabrication to characterization.

Fabrication and Optimization of Type II Silicon Clathrate Films

0 Views •

2025

The two-thermal annealing method enables the fabrication of thin films of type II semiconductor silicon clathrate. Post-synthesis treatments, including thermal pressing and reactive ion etching, were performed to improve the material properties. This approach provides an accessible pathway for fabricating tunable clathrate films suitable for next-generation electronic and photonic devices.

Preparation of Silicon Nanowire Field-effect Transistor for Chemical and Biosensing Applications

0 Views •

Cited by 4 •

2016

We describe key steps for biosensing by using polysilicon nanowire field-effect transistors, including the preparation of the device and the immobilization and confirmation of a DNA molecular probe on the nanowire surface, as well as conditions for DNA sensing.

Research

JoVE Journal - Bioengineering
Free Sample

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

0 Views •

Cited by 3 •

2011

Here we describe a simple method for patterning oxide-free silicon and germanium with reactive organic monolayers and demonstrate functionalization of the patterned substrates with small molecules and proteins. The approach completely protects surfaces from chemical oxidation, provides precise control over feature morphology, and provides ready access to chemically discriminated patterns.

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds

0 Views •

Cited by 9 •

2013

A detailed procedure for surface doping of Silicon interfaces is provided. The ultra-shallow surface doping is demonstrated by using phosphorus containing monolayers and rapid annealing process. The method can be used for doping of macroscopic area surfaces as well as nanostructures.

View All Results

FAQs

Related Topics