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JoVE Journal
Bioengineering

This content is Open Access.

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
 

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Article doi: 10.3791/3478
December 16th, 2011

Summary December 16th, 2011

Here we describe a simple method for patterning oxide-free silicon and germanium with reactive organic monolayers and demonstrate functionalization of the patterned substrates with small molecules and proteins. The approach completely protects surfaces from chemical oxidation, provides precise control over feature morphology, and provides ready access to chemically discriminated patterns.

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