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Preparation of Mica and Silicon Substrates for DNA Origami Analysis and Experimentation
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Preparation of Mica and Silicon Substrates for DNA Origami Analysis and Experimentation

Article DOI: 10.3791/52972-v • 12:03 min • July 23rd, 2015
July 23rd, 2015 •
1, 1, 2, 3, 2, 4, 3, 1
1Department of Chemistry and Biochemistry, University of Notre Dame, 2Department of Chemical and Biomolecular Engineering, University of Notre Dame, 3Department of Chemistry, Physics, and Engineering Studies, Chicago State University, 4Department of Technology, Ivy Tech Community College, South Bend, Indiana

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Summary
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Reproducible cleaning processes for substrates used in DNA origami research are described, including bench-top RCA cleaning and derivatization of silicon oxide. Protocols for surface preparation, DNA origami deposition, drying parameters, and simple experimental set-ups are illustrated.

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Mica Substrate Silicon Substrate DNA Origami Nanoelectronics Adhesion Substrate Choice Semiconductor Substrates DNA Origami Experiments Derivatized Silicon Oxide Self-assembled Monolayer 3-aminopropyltriethoxysilane (APTES) Aqueous Solution Photoresists Cleaning Processes Native Oxide Layer Functionalizable Surface Cleanrooms Silicon Cleaning
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