Electron Beam Lithography
Electron Beam Lithography - Related Videos
10:25
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Cited by 4 •
2018
We use an aberration-corrected scanning transmission electron microscope to define single-digit nanometer patterns in two widely-used electron-beam resists: poly (methyl methacrylate) and hydrogen silsesquioxane. Resist patterns can be replicated in target materials of choice with single-digit nanometer fidelity using liftoff, plasma etching, and resist infiltration by organometallics.
08:57
Focussed Ion Beam Milling and Scanning Electron Microscopy of Brain Tissue
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Cited by 105 •
2011
This protocol describes how resin embedded brain tissue can be prepared and imaged in the three dimensions in the focussed ion beam, scanning electron microscope.
07:53
Soft Lithography
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2023
Many BioMEM devices, such as microfluidic channels, are fabricated using the soft lithography technique. Here, a microscale pattern is replicated by curing an elastomeric polymer over the 3D structure. These polymeric structures are then used to create a wide range of devices, ranging from microfluidic channels for biosensing applications to microscale bioreactors for the visualization of micro-colonies. This video introduces photolithography and demonstrates the technique in the laboratory.
10:54
Cryo-electron Microscopy Specimen Preparation By Means Of a Focused Ion Beam
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Cited by 5 •
2014
Cryo Electron Microscopes, either Scanning (SEM) or Transmission (TEM), are widely used for characterization of biological samples or other materials with a high water content1. A SEM/Focused Ion Beam (FIB) is used to identify features of interest in samples and extract a thin, electron-transparent lamella for transfer to a cryo-TEM.
13:49
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Cited by 10 •
2020
We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.
FAQs
A focused electron beam is rastered across selected regions of the resist, depositing energy only where the pattern requires modification. This localized exposure changes the solubility of those regions, allowing the written geometry to be reproduced during development. Because the beam is directed point by point rather than through a fixed mask, researchers can control surface features precisely.
Development converts the exposure pattern into a physical relief structure by removing either the exposed or unexposed portions of the electron-sensitive resist. Which region is removed determines whether the remaining resist represents the intended feature or its surrounding area. Accurate development therefore preserves the spatial information written by the beam before later processing transfers the pattern.
The developed resist pattern serves as an intermediate template rather than the final engineered surface. Etching removes selected regions of an underlying material, whereas deposition adds material in locations defined by the resist pattern. These transfer steps convert the electron-written design into durable surface structures, microfluidic components, or other features used in biological environments.
Maskless writing allows the beam to produce a pattern directly on the resist without first creating a separate physical mask. This supports precise control over the arrangement of surface features and makes the written design the immediate basis for development and pattern transfer. In research, that control helps create engineered environments tailored to specific biological questions.
A typical workflow begins with writing the desired pattern into an electron-sensitive resist using a focused, rastered beam. Development then removes the designated resist regions, followed by etching or deposition to transfer the design into the underlying material. The resulting patterned surface can be incorporated into nanoscale structures, microfluidic components, or biomaterial interfaces.
Nanoscale and microscale patterns provide physical cues that can regulate where cells adhere, how they align, and how they migrate across a surface. By changing the arrangement of these features, researchers can create controlled environments for examining cell interactions with biomaterials and studying how surface organization contributes to tissue-level behavior.
Electron-beam-written structures support studies of cell behavior, tissue organization, biosensors, and interfaces relevant to regenerative medicine. The patterns can also be integrated into microfluidic components, linking controlled surface architecture with biological observation or interaction. These applications use the engineered environment to investigate how cells respond to precisely arranged material features.