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Instrument Calibration, Experimental Setup, and Parameter Tuning for Semiconductor Wafer Topography Imaging with AFM

Parallel Active Cantilever Arrays in AFMS to Enable High-Throughput Inspections

Article DOI: 10.3791/200439-v • 03:41 min • June 13th, 2023
June 13th, 2023 •
1, 1, 2, 3, 4,5
1Mechatronics Research Lab, Department of Mechanical Engineering, Massachusetts Institute of Technology, 2Mechatronics Group, Department of Mechanical Engineering, Ilmenau University of Technology, 3Production and Precision Measurement Technology Group, Institute of Process Measurement and Sensor Technology, Ilmenau University of Technology, 4Nanoscale Systems Group, Institute of Process Measurement and Sensor Technology, Ilmenau University of Technology, 5nano analytik GmbH

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Active Probe Atomic Force Microscopy Quattro-Parallel Cantilever Arrays High-Throughput Large-Scale Sample Inspection Atomic Force Microscope Nanoscale Surface Studies 3D Topography Images Imaging Throughput High-speed AFM Systems Dynamic Process Videos Chemical And Biological Reactions Semiconductor Wafers Nanofabricated Structures Nanoscale Spatial Resolution Imaging Static Sample High Productivity Passive Cantilever Probe Optical Beam Deflection System Imaging Throughput Active Cantilevers Embedded Piezoresistive Sensors Thermomechanical Actuators Parallel Operation Imaging Throughput Large-range Nano-positioners Control Algorithms Data-driven Post-processing Algorithms
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