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Metalassisteret elektrokemisk nanoimprinting af porøse og faste silicium wafere

Article DOI: 10.3791/61040-v • 09:18 min • February 8th, 2022
February 8th, 2022 •
1, 1, 1, 1
1The Polytechnic School, Arizona State University

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En protokol for metal-assisteret kemisk prægning af 3D mikroskala funktioner med sub-20 nm form nøjagtighed i faste og porøse silicium wafers præsenteres.

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Ingeniørvidenskab udgave 180 nanoimprinting elektrokemisk nanoimprinting MACE metalassisteret kemisk ætsning siliciumfotonik mikrofabrikation mikroengineering
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