Contact Resistance

Contact resistance is the electrical resistance that arises where two conductive surfaces meet, and it matters because even small interface losses can generate heat, reduce signal quality, and limit device reliability. At the microscopic level, surface roughness restricts conduction to a fraction of the apparent area, so current crowds through real contact spots while oxide films, contamination, contact force, and material properties alter resistance. Engineers analyze contact resistance when designing and testing connectors, switches, sensors, batteries, and power electronics. Controlling it through suitable materials, surface treatments, pressure, and maintenance improves electrical efficiency, measurement accuracy, and long-term performance.

Contact Resistance - Related Videos

Education

JoVE Core - Physics

Contact Angle

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2023

When a solid is dipped inside a liquid, the liquid surface becomes curved near the contact. For some solid–liquid interfaces, the liquid is pulled up along the solid, while for others, the liquid surface is convex or depressed near the solid surface. This phenomenon can be explained using the concept of cohesive and adhesive forces. The adhesive force is the molecular force between molecules of different materials, that is, between the molecules of the solid and the liquid. The cohesive force...

Research

JoVE Journal - Engineering

Analysis of Contact Interfaces for Single GaN Nanowire Devices

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Cited by 1 •

2013

A technique was developed that removes Ni/Au contact metal films from their substrate to allow for the examination and characterization of the contact/substrate and contact/NW interfaces of single GaN nanowire devices.

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds

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Cited by 9 •

2013

A detailed procedure for surface doping of Silicon interfaces is provided. The ultra-shallow surface doping is demonstrated by using phosphorus containing monolayers and rapid annealing process. The method can be used for doping of macroscopic area surfaces as well as nanostructures.

Research

JoVE Journal - Biology
Free Sample

Bioassays for Monitoring Insecticide Resistance

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Cited by 45 •

2010

This manuscript demonstrates and discusses techniques used to survey pesticide susceptibility and detect resistance to contact and systemic pesticides in arthropod pests.

Contact Hypersensitivity as a Murine Model of Allergic Contact Dermatitis

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Cited by 2 •

2022

Contact hypersensitivity (CHS) is a murine experimental model of allergic contact dermatitis (ACD). CHS is based on sensitization with reactive hapten by painting the shaved skin of the chest and abdomen, with a subsequent ear skin challenge with a diluted hapten, causing a swelling reaction that is assessed in various ways.

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