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JoVE Journal
Engineering
Analysis of Contact Interfaces for Single GaN Nanowire Devices
Analysis of Contact Interfaces for Single GaN Nanowire Devices
JoVE Journal
Engineering
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JoVE Journal Engineering
Analysis of Contact Interfaces for Single GaN Nanowire Devices

Analysis of Contact Interfaces for Single GaN Nanowire Devices

Full Text
9,783 Views
11:13 min
November 15, 2013

DOI: 10.3791/50738-v

Andrew M. Herrero1, Paul T. Blanchard1, Kris A. Bertness1

1Quantum Electronics and Photonics Division,National Institute of Standards and Technology

A technique was developed that removes Ni/Au contact metal films from their substrate to allow for the examination and characterization of the contact/substrate and contact/NW interfaces of single GaN nanowire devices.

The overall goal of this procedure is to allow for the examination and characterization of the contact substrate and contact nanowire interfaces for single gallium nitride nanowire devices. This is accomplished by first preparing a nanowire suspension and dispersing it onto a substrate. The second step is to deposit the nickel gold contacts on the nanowires and then a kneel the sample.

The final step is to remove the anal to nickel gold contacts from the substrate by adhering them to carbon tape. Ultimately, a scanning electron microscope is used to examine the contact interfaces for void formation. This method can help answer questions about how to process semiconductor nanowires.

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