Silicon Substrates

Silicon substrates are solid silicon wafers or layers that provide a chemically and physically controlled surface for building, studying, or supporting materials and devices. In chemistry, their properties depend on crystal orientation, electrical doping, surface defects, and reactions such as oxidation, which converts exposed silicon into a tunable silicon dioxide layer; additional treatments can attach molecules or alter wettability. These substrates support thin-film deposition, surface chemistry, electrochemical studies, microfabrication, and biosensor development. Controlling cleanliness, oxide thickness, and functional groups improves reproducibility and enables precise investigation of interfaces, catalysis, molecular attachment, and nanoscale material behavior.

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Research

JoVE Journal - Chemistry

Preparation of Mica and Silicon Substrates for DNA Origami Analysis and Experimentation

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Cited by 9 •

2015

Reproducible cleaning processes for substrates used in DNA origami research are described, including bench-top RCA cleaning and derivatization of silicon oxide. Protocols for surface preparation, DNA origami deposition, drying parameters, and simple experimental set-ups are illustrated.

Growth of Gold Dendritic Nanoforests on Titanium Nitride-coated Silicon Substrates

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Cited by 5 •

2019

This study presents a feasible procedure for synthesizing gold dendritic nanoforests on titanium nitride/silicon substrates. The thickness of gold dendritic nanoforests increases linearly within 15 min of a synthesis reaction.

Stiffness Measurement of Soft Silicone Substrates for Mechanobiology Studies Using a Widefield Fluorescence Microscope

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Cited by 19 •

2018

Substrates with stiffness in the kilopascal-range are useful to study the response of cells to physiologically relevant micro-environment stiffness. Using just a widefield fluorescence microscope, the Young's modulus of soft silicone gels can be determined using an indentation with a suitable sphere.

Fabrication and Optimization of Type II Silicon Clathrate Films

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2025

The two-thermal annealing method enables the fabrication of thin films of type II semiconductor silicon clathrate. Post-synthesis treatments, including thermal pressing and reactive ion etching, were performed to improve the material properties. This approach provides an accessible pathway for fabricating tunable clathrate films suitable for next-generation electronic and photonic devices.

Generation of Polyacrylamide and Silicone Extracellular Matrix Substrates with Defined Stiffness for Cell Biology Applications

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2026

Although extracellular matrix (ECM) stiffness is a key regulator of cellular behavior, the underlying sensing and transduction mechanisms remain unclear. To address this, we provide protocols for creating polyacrylamide- and silicone-based substrates with tunable stiffness to advance our understanding of cell-ECM crosstalk.

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