Single Photon Lithography
Single Photon Lithography - Related Videos
07:53
Soft Lithography
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2023
Many BioMEM devices, such as microfluidic channels, are fabricated using the soft lithography technique. Here, a microscale pattern is replicated by curing an elastomeric polymer over the 3D structure. These polymeric structures are then used to create a wide range of devices, ranging from microfluidic channels for biosensing applications to microscale bioreactors for the visualization of micro-colonies. This video introduces photolithography and demonstrates the technique in the laboratory.
08:59
Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils
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Cited by 16 •
2020
This protocol introduces a lithography-free micropatterning method that is simple and accessible to those with a limited bioengineering background. This method utilizes customized laser-cut stencils to micropattern extracellular matrix proteins in a shape of interest for modulating cell morphologies. The procedure for micropatterning is demonstrated using induced pluripotent stem cell derived cardiomyocytes.
07:31
In Vivo Two-Photon Microscopy of Single Nerve Endings in Skin
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Cited by 13 •
2014
The protocol for dynamic longitudinal imaging and selective laser lesion of nerve endings in reporter transgenic mice is...
10:09
Capillary Force Lithography for Cardiac Tissue Engineering
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Cited by 27 •
2014
In this protocol, we demonstrate the fabrication of biomimetic cardiac cell culture substrata made from two distinct polymeric materials using capillary force lithography. The described methods provide a scalable, cost-effective technique to engineer the structure and function of macroscopic cardiac tissues for in vitro and in vivo applications.
01:00
Single Photon Emission Computed Tomography for Assessing Brain Function Disruption
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2025
A traumatic brain injury, or TBI, impairs blood flow to the impacted regions and disrupts the activity of dopaminergic neurons.To investigate TBI-associated disruptions, begin by intravenously injecting a lipophilic radioactive tracer into a patient.The tracer travels through the cerebral vessels and diffuses into cells of the cortical and subcortical brain tissue.Perform single photon emission computed tomography, or SPECT, to detect the tracer-emitted radiation. The resulting signal intensity...
FAQs
The wavelength must match the photoresist or photopolymer’s light response so that absorption occurs where intended. Optical characteristics then determine how precisely that exposure is delivered, while the material response influences whether the exposed region polymerizes or changes solubility. Coordinating wavelength, optics, and exposure conditions is therefore central to transferring a controlled microfabrication pattern.
The photoinitiator converts absorbed light into reactive species that locally start polymerization or alter the material’s solubility. Because this response occurs in the exposed region, the photoinitiator connects photon absorption with the chemical change needed to form a pattern. Its behavior must remain consistent with the selected wavelength, material, and exposure conditions for reliable feature formation.
Exposure can either cause a photopolymer to polymerize or change how a photoresist dissolves during development. The developer then removes the regions selected by that material response, revealing the intended structure. This relationship between local chemical change and selective removal determines which portions remain in the finished pattern, making material behavior as important as the optical exposure.
Resolution depends on several linked factors rather than on photon absorption alone. Wavelength establishes the scale of the optical interaction, optics determine how the light is focused or delivered, and exposure conditions influence the material response. Variations in any of these factors can change feature precision, so process control is required when producing consistent microstructures or device patterns.
A typical workflow exposes a light-sensitive material through a selected pattern, allowing absorbed photons and the photoinitiator to produce a localized chemical change. The material is then developed so that selected regions are removed, revealing the remaining structure. The final pattern depends on coordinating the exposure method, wavelength, optics, material response, and development step.
The choice depends on how the pattern is delivered to the light-sensitive material. Mask-based fabrication transfers a pattern through a mask, whereas direct writing produces the pattern without relying on that same mask-based transfer. Both approaches support microstructure fabrication, so the appropriate choice can be matched to the intended engineering design and manufacturing workflow.
This technique can produce precise features for microstructures, optical components, sensors, and electronic devices. Its value in engineering comes from combining controlled light exposure with material changes that can be selectively developed into functional patterns. Resolution depends on wavelength, optics, material response, and exposure conditions, so careful process control helps translate a design into a usable device feature.