Login processing...

Trial ends in Request Full Access Tell Your Colleague About Jove
JoVE Journal
Bioengineering

A subscription to JoVE is required to view this content.
You will only be able to see the first 20 seconds.

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
 

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Article doi: 10.3791/60004
January 19th, 2020 Usage Statistics

Summary January 19th, 2020

We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.

Read Article

Get cutting-edge science videos from JoVE sent straight to your inbox every month.

Waiting X
simple hit counter