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JoVE Journal
Bioengineering

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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
 

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Article DOI: 10.3791/60004-v
January 19th, 2020

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Summary January 19th, 2020

We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.

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