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Atomically Traceable Nanostructure Fabrication
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JoVE Journal Engineering
Atomically Traceable Nanostructure Fabrication

Atomically Traceable Nanostructure Fabrication

DOI:
10.3791/52900-v

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12:35 min

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July 17, 2015

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, , , , , , , , , , , , , , , ,
1Zyvex Labs, 2Department of Physics,University of Texas at Dallas, 3Department of Materials Science and Engineering,University of Texas at Dallas, 4Materials Science and Engineering,University of North Texas, 5National Institute of Standards and Technology

Chapters

  • 00:05Title
  • 02:15Scanning Tunneling Microscopy and Lithography
  • 05:42Atomic Layer Deposition
  • 06:37Atomic Force Microscopy and Reactive Ion Etching
  • 08:47Scanning Electron Microscopy
  • 09:58Results: Surface Patterning with Selective Atomic Layer Deposition and Reactive Ion Etching
  • 11:39Conclusion

Summary

Automatic Translation

Automatic Translation

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

Tags

Keywords: Atomic ScaleNanostructure FabricationHydrogen Depassivation LithographyAtomic Layer DepositionTitaniaReactive Ion EtchingNanofabrication ProcessFiducial MarksSi(100)-H Surface

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