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Journal / Chemistry / U2O5 Film voorbereiding via UO2 afzetting door…
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Chemistry

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U2O5 Film voorbereiding via UO2 afzetting door gelijkstroom sputteren en opeenvolgende oxidatie en reductie met atomaire zuurstof en waterstof atoom
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U2O5 Film voorbereiding via UO2 afzetting door gelijkstroom sputteren en opeenvolgende oxidatie en reductie met atomaire zuurstof en waterstof atoom

Article DOI: 10.3791/59017-v • 12:05 min • February 21st, 2019
February 21st, 2019 •
1, 1, 1, 1
1European Commission, Joint Research Centre, Directorate for Nuclear Safety and Security

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Dit protocol stelt de voorbereiding van U2O5 dunne lagen verkregen in situ onder ultra hoog vacuüm. Het proces omvat oxidatie en reductie van UO2 films met atomaire zuurstof en waterstof atoom, respectievelijk.

Tags

Chemie kwestie 144 U2O5 UO3 UO2 film DC sputteren X-ray photoemission spectroscopie oxidatie vermindering
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