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Journal / Engineering / Rendering SiO2/Si Surfaces Omniphobic door…
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Engineering

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Rendering SiO2/Si Surfaces Omniphobic door Carving Gas-Entrapping Microtextures Bestaande uit Reentrant en Dubbel Reentrant Cavities of Pilaren

Article DOI: 10.3791/60403-v • 08:02 min • February 11th, 2020
February 11th, 2020 •
1, 1, 1, 1, 2, 2, 1
1Water Desalination and Reuse Center (WDRC), Biological and Environmental Science and Engineering (BESE) Division, King Abdullah University of Science and Technology (KAUST), 2Core Labs, King Abdullah University of Science and Technology (KAUST)

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Dit werk presenteert microfabricageprotocollen voor het bereiken van holtes en pilaren met reentrant- en dubbelreentrantprofielen op SiO2/Si wafers met behulp van fotolithografie en droge etsen. Resulterende microtextuur oppervlakken tonen opmerkelijke vloeibare pellence, gekenmerkt door robuuste lange termijn beknelling van lucht onder bevochtigende vloeistoffen, ondanks de intrinsieke natheid van silica.

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Engineering bevochtiging omniphobicity reentrant en dubbel reentrant holtes / pilaren gas-entrapping microtexturen (GEMs) fotolithografie isotropische ets anisotropische ets thermische oxide groei reactieve-ion etsen contacthoeken onderdompeling confocale microscopie
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