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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
Journal JoVE
Chimie
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Journal JoVE Chimie
Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

DOI:
10.3791/59376-v

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07:00 min

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March 20, 2019

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, ,
1Advanced Manufacturing Research Institute, Department of Electronics and Manufacturing,National Institute of Advanced Industrial Science and Technology (AIST)

Chapitres

  • 00:04Titre
  • 01:00Formation of the Cu(I) in The Plating Solution
  • 02:48Quantitative Measurement of the Cu(I)
  • 03:46Injection Measurement of Cu(I) and BCS Color Reaction Curves
  • 04:46Results: Analysis of the Cuprous Ions from the Copper Sulfate Plating Solution
  • 06:17Conclusion

Summary

Traduction automatique

Traduction automatique

Here, accumulation of cuprous ions in a copper sulfate plating solution in a model experiment and an analysis based on quantitative measurements are described. This experiment reproduces the accumulation process of cuprous ions in the plating bath.

Tags

Copper SulfatePlating SolutionMonovalent CopperQuantificationOptical EvaluationNitrogen GasCopper PlatePlatinum PlatePower SupplyUV-Vis Spectrophotometer

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